Dose deposition at low energy

Dear Fluka experts,

I’m trying to score the dose deposition produced by low-energy electrons in Al. Al is only a few hundred nm thick. I found that when I reduced the electron energy to 200keV, usrbin showed that most of the energy was deposited in the first bin. As I continue to reduce the electron energy to 100KeV and below, All the energy is deposited in the first bin. I don’t know if it is caused by the setting of fluka electron transfer threshold.

My problem is how to score the dose deposition of low-energy electrons in a thin target.

Thanks in advance!

Good morning,

Please check the fluka manual for EMFCUT:
https://flukafiles.web.cern.ch/manual/chapters/description_input/description_options/emfcut.html?highlight=emfcut

Hoping this will solve your scoring issue,

Cheers,
J.Baptiste

Dear @jpotoine ,

Thank you very much for your help, This information is really helpful.

Cheers,
Zhuorun